Showing posts with label TSV. Show all posts
Showing posts with label TSV. Show all posts

Monday, March 2, 2015

ISSCC 2015 -Latest Circuits Innovations

Below are some highlights from 2015 " International Solid-State CircuitsConference once again served up a smorgasbord of silicon innovations."

It is interesting that while Samsung is continuing to develop 3D devices and processing on a single chip -

"Samsung described a second generation of its 128 Gbit 3-D NAND flash, a 3-bit/cell version with 32 layers now in production on a 68.9mm2 die. The Korean giant is ahead of the pack in dense flash and also is expected to beat TSMC to market with 14/16nm FinFET logic later this year, a fact that help it retain archrival Apple as a foundry customer."

ITRS and Intel focus on developing chip stacks - 

"Paolo Gargini who leads the ITRS semiconductor road map effort said chip stacks are today what high-K metal gate design was in 2007, the next big requirement for progress.

Intel fellow Mark Bohr disagreed. “We need vertical interconnects one or two orders of magnitude more dense than today’s through-silicon vias,” he said"


Ron
Insightful, timely, and accurate semiconductor consulting.
Semiconductor information and news at - http://www.maltiel-consulting.com/





18 Views of ISSCC

Intel, Xilinx debate 3-D chip stacks
Rick Merritt  2/26/2015 10:42 AM EST 

Monday, April 28, 2014

3D NAND and TSV Process

The article below discusses the development of 3D NAND flash memory. The explanation of the difficulty of creating these 3D structures uses the term Through Silicon Via (TSV) to explain how to connect vertically between layers that are one above the other inside an IC chip.

However, TSV is used only when we are connecting between individual silicon IC chips one to another. Holes are drilled through each chip to connect them electrically when they are stacked on top of each other.

Samsung and its competitors are building the 3D  NAND transistors inside each chip. This 3D approach has its own difficulties of connecting all the vertical layers one to the next.


Ron
Insightful, timely, and accurate semiconductor consulting.
Semiconductor information and news at - http://www.maltiel-consulting.com/




Silicon bungalow? Nah, I'll have SK Hynix's 4-storey flash condo

Chip-embiggening 3D NAND wizardry expands upwards

DRAM and flash fabber SK Hynix is set to mass produce 3D NAND by the end of this year, while Micron Technology sees its own 3D mass production kicking in during the second half of 2015.

By building NAND chips with layers of current planar cells (known as 2D NAND) the amount of capacity in a chip's footprint can be raised without needing to go to smaller flash cell geometries.

With smaller cell sizes, its working life (endurance) goes down while its error rate goes up. SanDisk has just announced a 15nm process (1Z), moving down from the 19nm (1X) size used by it and its fab partner Toshiba.

Samsung has SSDs available using 19nm technology. SK Hynix began full-scale production of 16nm flash chips at the end of 2013.

Micron expects to have a 16nm SSD in the first half of this year. This can keep it going on the capacity raising front but it seems unlikely that it, and the industry will move to sub-15nm cell sizes because of these scaling-related problems.

That means its ability to increase planar chip capacity without increasing the chip's footprint size will come to an end, and so 3D NAND, with stacked planar layers, is seen as the answer to increasing capacity requirements until some denser 2D post-NAND technology becomes available.

Think of 3D flash cells as being like condos – blocks of apartments in a housing estate – with planar cells being single-storey dwellings. You can house more people in a fixed estate area using 4-storey condos than you can with single storey homes.
Hypothetically, if a 128Gbit planar chip is possible with 16nm NAND while, say, only 64Gbit is available with 19nm NAND, a 4 layer 19nm chip could provide 256Gbits. That's twice the capacity of the planar 16nm chip but within the same footprint. An 8-layer, 19nm 3D chip could provide 512Gbits, trouncing the 16nm planar cell's 128Gbit capacity.

A 4-layer, 16nm cell chip could provide 512Gbit capacity and an 8-layer chip 1,024 Gbits, making for lots of decent selling conversations between NAND chip reps and tablet/mobile phone suppliers.

It's not going to be as simple as this because vertical tunnels between the layers are needed to connect them to a base layer of logic circuitry. These connecting holes, Through-Silicon Vias (TSVs), use up some of each chip layer's area. The more layers you have, the more TSVs you need, thus (we understand) you need more logic in the base layer. Consequently the production and testing process becomes more and more complicated.

SK Hynix began full-scale production of 16nm flash in June, 2012, and moved to a 2nd gen process at the end of 2013. If it can get the number of layers high enough in its coming 3D chips then it could gain a significant capacity advantage over its competitors' planar chips.

The company is also aiming to introduce its own flash controllers and produce 3-layer cell (TLC) NAND using its 16nm technology.

Friday, December 27, 2013

3D Semiconductors-TSV w/ DRAM Memory

 Four High Bandwidth Memory stacks on one integrated chip.



Hynix just announced System in Package (SIP) on a single circuit board by combining 4 stacked DRAM using Through-Silicon Via (TSV) with AMD graphic chip (see below).

Hynix is trying to advance 3D manufacturing using TSV. TSV is essentially advanced packaging manufacturing where holes are drilled through each chip to connect them electrically when they are stacked on top of each other.

More about Through-Silicon Via (TSV) Introduction - 3D Integration & Through Silicon Via(TSV) and The future of computers: 3D chip stacking

While Samsung announced  in August 3D NAND using 3D during the chip manufacturing 1Tb SSD: 3D Vertical NAND


Ron
Insightful, timely, and accurate semiconductor consulting.
Semiconductor information and news at - http://www.maltiel-consulting.com/



Moore’s Law

SK Hynix Develops 4x Faster DRAM


SK Hynix reported on December 26th that it has developed the industry’s first High Bandwidth Memory (HBM) DRAM, using Through-Silicon Via (TSV) chip packaging technology.
TSV is a method of transmitting electrical signals through chips by way of creating an electrode that vertically passes through two or more chips, enhancing performance efficiency and reducing chip size.
The DRAM, which is undergoing review for standardization by the Joint Electron Device Engineering Council (JEDEC), is a high-performance, low-power, high-density memory product.  It only draws 1.2 volts of power per 1GB of data processed per second. Through its 1,024 Input/Output Gateways it can transfer 128GB of data per second, about 4 times faster than GDDR5 with 40% less power required.
SK Hynix used TSV technology to stack 4 DRAM chips on top of each other, each chip only 20nm high. The company worked in conjunction with leading graphic chipset maker AMD to put the chips in a System in Package (SIP) on a single circuit board.
The product is projected to be used in the graphics-heavy high-performance market, with future applications in supercomputer networks and servers.
More

Tuesday, July 23, 2013

SanDisk and 3D NAND



SanDisk is strongly pursuing 3D NAND  with Toshiba. 3D NAND is a very strong contender for future advances in NAND shrinking. See more below



Some background about 3D NAND and at
3D NAND flash is coming

 Ron
Insightful, timely, and accurate semiconductor consulting.
Semiconductor information and news at - http://www.maltiel-consulting.com/



SanDisk starts beating path to 3D NAND flash

Reckons product ready for market by 2015

Monday, December 3, 2012

3D Flash NAND Devices and Process

The article below discusses developments in 3D Flash NAND. Toshiba and Macronix have different approaches. See more details about Toshiba Next NAND- 3D with 15 Layers.


Applied material discusses processing issues and new equipment to address them.

"According to Applied Materials, building 3D NAND structures in like trying to dig a one-kilometer-deep, three-kilometer-long trench with walls exactly three meters apart, through interleaved rock strata."

Ron Maltiel
www.maltiel-consulting.com





3D NAND flash is coming

http://www.edn.com/electronics-blogs/practical-chip-design/4401542/3D-NAND-flash-is-coming

Brian Bailey - November 15, 2012

Flash memory has very quickly risen from being an obscure memory type to perhaps becoming the dominant memory type for many devices, including music players, cell phones, tablets and now increasingly servers and mainstream PCs. But flash memory does not scale quite as well as the more traditional DRAM that it is replacing. It is thought that DRAM can scale down to 1nm whereas we are already hitting some problems with the scaling of the floating gate in NAND flash. It is not thought that planar NAND can go below 10nm which is only a couple of processes steps away from where we are today.


There are several other types of memory being developed, including spin-torque MRAM and Resistive RAM (ReRAM) that may replace both RAM and flash in the future. Another exciting direction is 3D NAND structures. In some respects this is similar to FinFET development for traditional transistors that are finding their way into 20nm and 14nm processes.


Toshiba is one company pushing 3D NAND processes with its p-BiCS (pipe-shaped Bit Cost Scalable) technology. The thought is that rather than lay the cells flat on the surface, higher densities can be achieved by stacking them on top of each other. This is shown diagrammatically in the figure below. As you can see this is not the same as 3D ICs where multiple substrates are layered on top of each other and connected using through silicon vias (TSV), this is building cells on top of each other to create U shaped bit lines. They currently have 16 layers devices where the hole size is 50nm and Toshiba says that the process becomes cheaper than the traditional NAND processes when more than 15 layers are created. Samples are expected next year and volume shipments by 2015...
  Additional details

Tuesday, October 16, 2012

Toshiba Next NAND- 3D with 15 Layers


The winner for the next flash memory approach is still not clear. A strong candidate is stacking memory NAND dies one on top of another. The dies are connected using Through Silicon Vias (TSV). Toshiba has a different approach to 3D " not stacking NAND chips one atop the other but rather stacking layers of NAND in a single chip" See more details below.

The key concern for next NAND generations is the 5 years lead time to build a new $5 billion fab, which could be designed for the wrong process technology.

It does not help that "the number of electrons in a gate decreases as the process geometry size is reduced....below 10nm the number of critical electrons in a gate can be as few as 10 – and that losing 10 electrons could seriously affect the gate's functioning. He says there are a variety of issues with such very small cells, such as bit-line loading, interference and leakage, leading to signal retention and reliability issues, for which, currently, there are no solutions.




These problems may make 10nm NAND technology impractical and sub-10nm impossible. Park suggests that 3D stacking, putting dies on on top of another, could be away out of this trap. He charts various approaches and identifies issues with each one, mentioning yield and retention as overall issues" (see more at Flashboys: HEELLLP, we're trapped in a process size shrink crunch)

Ron
www.maltiel-consulting.com



The 3D die stack tack: Toshiba builds towering column of flash


Resistance is futile
By Chris Mellor, 15th October 2012 09:28 GMT


Toshiba is building high rise flash and ReRAM chips, with prototypes coming next year and volume shipping in 2015.

The idea of high-rise or 3D chips is that we can sidestep limitations on increasing the storage density of flash or memory chips by stacking them one on top of the other, increasing the storage density on a Mbits/in 2 basis by building upwards, in the same way as high-rise housing increases the number of people living in the ground footprint of a block of flats.

Hot on the heels of our story about the NAND scaling trap [1], with 3D NAND and ReRAM suggested as two of the potential escape routes, we learn from Nikkei Electronics [2] that Toshiba is building 3D dies using a type of NAND, its p-BiCS (pipe-shaped Bit Cost Scalable) [3] technology, and also a coming replacement technology for NAND, ReRAM (Resistive RAM) which combines attributes of RAM and NAND to provide byte addressability, DRAM-class speed and NAND non-volatility.

As the slide below shows, 3D flash involves layers of NAND dies with communicating holes - TSVs or Through Silicon Vias - linking them to a stack controller at the base of the stack. It is not stacking NAND chips one atop the other but rather stacking layers of NAND in a single chip.




Toshiba p-BiCS technology [4]

Toshiba's p-BiCS NAND has a 50nm-size hole and 16 layers. Toshiba's chief engineer, Masaki Momodomi, at its Semiconductor & Storage Products Co., says that p-BiCS becomes cheaper than ordinary NAND when more than 15 layers are used, presumably comparing similar capacity levels. The company aims to deliver 128Gbit and 256Gbit prototype samples next year, engineering samples in 2014, with volume shipments in 2015; we are more than two years away from seeing product hit the streets.

The ReRAM [5] technology has a similar timescale though at lower capacities. It has much faster write times than NAND and Toshiba sees it fulfilling a different role from p-BiCS, being used closer to CPUs than p-BiCS, with STT-RAM being used for cache memories in, for example, SSDs. This is a similar hierarchy to the one proposed by Hynix in our NAND Scaling Trap story today. Jim Handy of Objective Analysis said; "It makes sense that ReRAM … would be used in performance applications, though. They are far faster at writes than NAND is, they are random access devices which NAND is not, and they don't need ECC. All this lends itself to faster performance."

Toshiba's ReRAM technology will appear in the same sequence of prototype samples, engineering samples and volume production as p-BiCS with the same general timing. A picture of a 64Gbit ReRAM device was shown at the Toshiba briefing attended by Nikkei Electronic but Toshiba intends to deliver generally equivalent p-BiCS and ReRAM capacities.

It is set of reducing the size of its current 1Xnm (19nm) NAND cells, and will target 1Ynm (18-14nm we understand) products this year and 1Znm (10-13nm) products next year.

Handy said: "All those new technologies (MRAM, ReRAM, FRAM...) perform better than NAND (BiCS is a kind of NAND) but are more costly. In memory cost is everything so these alternatives don't do well. The promise of these technologies is that they will move right past NAND's scaling limit. If they do that they will eventually become cheaper than NAND, but not until NAND has stopped scaling for 2 process generations.

"Toshiba talks about 1y and 1z, their processes after 19nm. I suspect that NAND will stop scaling at around 10nm, but BiCS will cause NAND pricing to continue to decline after that. Of course, those geniuses who have been coaxing NAND as far as 19nm could very well keep pulling rabbits out of their hats and push it well beyond 10nm - time will tell."

Will we see continued NAND process size decreases or 3D as the chosen way to get more capacity from a NAND die's footprint? Handy said: "The most recent ITRS [International Technology Roadmap for Semiconductors] [6] roadmap plots out two different directions for NAND - vertical (BiCS) and conventional. The industry really doesn't know where it's going to go, but it has plans in place for either eventuality."

Tuesday, March 20, 2012

Is Samsung Cutting Qualcomm's Cord?

Samsung continues its successful juggernaut of supporting competitors chips while introducing its own products. Their advances in process and circuit technology such as Through Silicon Via (TSV) will strengthen their edge.


Is this a lesson for Intel on how to leverage their technology edge...

Ron Maltiel




Samsung cuts dependence on Qualcomm
http://www.koreatimes.co.kr/www/news/tech/2012/03/129_107204.html
By Kim Yoo-chul,  03-19-2012
Smartphone maker plans to use in-house chips for Galaxy S III

Samsung Electronics will use its single-chip solutions for its next smartphone, the Galaxy S III, to lower dependence on U.S. chipmaker Qualcomm.

The move comes as Samsung, the world’s top memory chipmaker, aggressively shifting focus to more profitable and less-volatile non-memory chips.Memory chips like DRAMs and NAND flashes are used to read and write data with these chips being commoditized. Thus they are cheap, compared with non-memory chips. Non-memories are to control an entire computing system and require advanced chip-making technology.

``Samsung’s single-chip solution is a combination of long-term evolution (LTE), telecommunications and W-CDMA functions,’’ a high-ranking company executive said Monday.The firm’s Exynos-branded quad-core mobile application processors (APs) are to be equipped in the Galaxy S II’s successor, according to the executive.``We don’t think there will be big technology-related problems as we have already tested our telecommunications chips in some smartphones and tablets for consumers in North America. Also, Google’s first reference mobile, the Galaxy Nexus, is using Samsung's telecom chips,’’ said the executive.
``Samsung has a stronger intent to lower its dependence on Qualcomm and our technicians believe that we have made significant progress in producing logic-based chips for high-end devices, combined logic and memory chips for graphic controllers and core communication chips for Internet-enabled consumer devices,’’ said the executive.

Amid the explosive growth for LTE-enabled smartphones globally, the decision could hurt San Diego-based Qualcomm in the mid- to long-term, according to analysts.``Samsung is paying huge amounts to Qualcomm in return for using its single-chip solutions in strategic digital devices, however, Qualcomm is gradually losing its edge,’’ said another Samsung executive. Both executives asked not to be identified as they don’t have the right to officially speak to the media.

Samsung, which was the world’s biggest smartphone seller last year, plans to sell 250 million smartphones this year, up 25 percent from its earlier target of 200 million.


Ambitious Samsung, uneasy Qualcomm
So far, Samsung Electronics is an earnings propeller for Qualcomm because the American firm was the sole provider of one-chip solutions. ``It was believed that Qualcomm chips had greater stability and suited easy upgrades. But, that’s the old story,’’ said the Samsung executives.

In line with its plan, Samsung is improving ``through silicon via’’ (TSV) memory stocking technology. ``Our long-term plan is clear. Using Samsung solutions for Samsung products.’’

To prevent Qualcomm from losing one of its top customers, it recently announced the launch of its fifth-generation Gobi reference platform that seeks to pack support nearly all major worldwide mobile standards into a single chip. Based on the company’s Gobi LTE wireless baseband modems, the MDM9615 and MDM9215 deliver fast LTE connectivity with backwards compatibility to both HSPA+ and EV-DO networks, Qualcomm insists.

``This will allow support for regional LTE frequencies with backwards compatibility to existing 2G and 3G technologies, allowing Gobi LTE devices to connect to faster LTE network locallys and stay connected to the Internet globally on 3G networks worldwide,’’ it added.

Both Qualcomm officials in South Korea, and Samsung Electronics spokesman Ken Noh declined to comment on the Korean firm’s plans.

Samsung’s transition towards becoming a solutions provider and a chip supplier is strengthening as its mobile head Shin Jong-kyun is injecting more resources to expand the management of its own telecom chips.``Our division is not just to produce smartphones and tablets. In order to diversify portfolios, our division should do better for telecom chips,’’ said Shin.
The chip division is handling mobile APs and the head of the company’s device solution unit, which encompasses flat-screens and memory chips, recently told The Korea Times that its mobile AP-making factory in Austin, Texas, became fully operational last year. Apple’s i-devices use Samsung’s mobile APs produced at the Austin plant.

The Exynos chip is currently built using a 45-nanometer process but the new Exynos chip will be made with 32-nanometer technology, giving better performance quality without using as much power. Samsung said that in terms of performance, it gives up to 26 percent more than the current 45-nanometer chip, with battery life improved by half. The new version will be used in the Galaxy S III.

This in itself is good news for consumers who rely on battery performance when choosing devices.``The development of quad-core mobile APs is finalized and the decision to make one-chip solutions was by Shin,’’ said an executive at the company’s semiconductor division.``If Samsung successfully strengthens its management for telecommunications chips, then it expects to see more revenue from smartphones and tablets. That’s the scenario we hope,’’ said the unnamed executive.
Samsung has a cross-licensing deal with Qualcomm until 2024 to use the American firm’s single-chip solutions.
Switzerland-based brokerage UBS has raised its target for Samsung Electronics shares to 1.48 million won citing a rising shares in smartphones.